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Delineation of Ion Implanted Semiconductor Devices For Physical Measurement

IP.com Disclosure Number: IPCOM000066098D
Original Publication Date: 1979-Jan-01
Included in the Prior Art Database: 2005-Feb-19

Publishing Venue

IBM

Related People

Authors:
Bullard, RL Hobbs, CW [+details]

Abstract

In order for the size and shape of an ion implant to be measurable optically, it must first be delineated. The following process produces a physical delineation of an n type implant in p type silicon.