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Gas Dispersion Technique

IP.com Disclosure Number: IPCOM000066243D
Original Publication Date: 1979-Feb-01
Included in the Prior Art Database: 2005-Feb-19

Publishing Venue

IBM

Related People

Authors:
Stetson, WJ [+details]

Abstract

This article discloses a technique for achieving a homogeneous mixture of gases in a low pressure environment such as may be found in a sputtering or evaporation process. In a typical sputtering apparatus, unless there is uniform gas dispersion, the reaction process is nonuniform. It has now been found that if one uses helium gas as a carrier gas within the vacuum deposition equipment more uniform gas dispersion is achieved throughout the deposition chamber and within the plasma region.