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Resist Lift-Off Mask With Controllable Over-hand Thickness

IP.com Disclosure Number: IPCOM000066269D
Original Publication Date: 1979-Feb-01
Included in the Prior Art Database: 2005-Feb-19

Publishing Venue

IBM

Related People

Authors:
Chiu, GT Ma, WHL [+details]

Abstract

A multilayer resist coating is applied without loss of thickness because of solvent attack of the previously applied layer when coating the next layer. A resist lift-off mask is produced by any exposure system including optical and E-beam.