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Loading System For Charging Ion Implant Source Chamber

IP.com Disclosure Number: IPCOM000066277D
Original Publication Date: 1979-Feb-01
Included in the Prior Art Database: 2005-Feb-19

Publishing Venue

IBM

Related People

Authors:
Bayer, EH Frederick, JJ Jung, G Popp, G [+details]

Abstract

With currently used ion implant sources, a consumable cartridge or pellet of dopant material, such as arsenic, is placed in an oven within a source chamber that must be held under vacuum conditions. Such an oven is illustrated in Fig. 3. Presently this is done by withdrawing an oven sealing stick from the source chamber and utilizing a second tool, called a load stick, to insert the arsenic pellet through the source chamber and place it in the oven. The load stick is then withdrawn, and the seal stick is replaced to reseal the chamber and oven. The effect of this sequence of operations is to lose vacuum in the source chamber, which requires repumping of the entire chamber before resumption of operation with the ion source is possible.