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Use Of A Magnetic Field To Adjust The Stoichiometry of Plasma-Deposited Thin Films

IP.com Disclosure Number: IPCOM000066338D
Original Publication Date: 1979-Feb-01
Included in the Prior Art Database: 2005-Feb-19

Publishing Venue

IBM

Related People

Authors:
Chen, M Coburn, J Lee, K Minkiewicz, VJ [+details]

Abstract

The chemical composition of plasma-deposited thin films is determined by the elemental composition of the gas phase species which condense to form the film. A new method that enables the composition of the gas phase species incident on a substrate to be varied involves the application of a magnetic field to the discharge zone.