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Electrostatically Controlled Micro-mechanical Switches Fabricated From All-Amorphous Films On Arbitrary Substrates

IP.com Disclosure Number: IPCOM000066344D
Original Publication Date: 1979-Feb-01
Included in the Prior Art Database: 2005-Feb-19

Publishing Venue

IBM

Related People

Authors:
Petersen, KE [+details]

Abstract

Micromechanical switches, such as those described by K.E. Petersen, IEEE Transactions on Electron Devices, ED-25, 1241 (1978), are fabricated from amorphous materials with the following procedure. As shown in Fig. 1, a layer of chromium 10 is deposited on an arbitrary substrate 12, such as polished glass. On top of the chromium layer 10 a layer of amorphous silicon 14 and a layer of a masking material, such as silicon dioxide or silicon nitride, is deposited. The silicon dioxide layer is etched to leave a rectangle 16, as shown, wherever a switch is desired. The amorphous silicon is etched with an etchant, such as ethylene diamine and pyrocatechol.