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Room Temperature, Plasma Chemical Transport Deposition of Metal (Gold) Films

IP.com Disclosure Number: IPCOM000066378D
Original Publication Date: 1979-Feb-01
Included in the Prior Art Database: 2005-Feb-19

Publishing Venue

IBM

Related People

Authors:
Zarowin, CB [+details]

Abstract

A substrate is to be coated with a film of gold by plasma chemical transport. The substrate is placed on the grounded electrode (maintained at room temperature) of a chemical transport system. The substrate is subjected to a low RF power density (1/4 watt/cm/2/) chlorine plasma, while a source of gold is secured to the driven electrode. A gold film is deposited upon the substrate at rates of about 0.1 micrometer/minute at a pressure of 40 millitorr of chlorine gas.