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Flash X-Ray Lithography/Microscopy

IP.com Disclosure Number: IPCOM000066588D
Original Publication Date: 1979-Mar-01
Included in the Prior Art Database: 2005-Feb-20

Publishing Venue

IBM

Related People

Authors:
Angilello, J Coleman, G Feder, R LaPlaca, S McCorkle, R [+details]

Abstract

The use of a high intensity flash X-ray source, such as that described by McCorkle and Vollmer (*), which produces an emission peak in the soft X-ray region, provides adequate exposure of a photoresist for X-ray lithography. The photoresist can be fully exposed with a single flash.