Flash X-Ray Lithography/Microscopy
Original Publication Date: 1979-Mar-01
Included in the Prior Art Database: 2005-Feb-20
The use of a high intensity flash X-ray source, such as that described by McCorkle and Vollmer (*), which produces an emission peak in the soft X-ray region, provides adequate exposure of a photoresist for X-ray lithography. The photoresist can be fully exposed with a single flash.