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Technique For Automatic Subdivision of Pattern Data For Enhanced Proximity Effect Corrections Disclosure Number: IPCOM000066610D
Original Publication Date: 1979-Mar-01
Included in the Prior Art Database: 2005-Feb-20

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Parikh, M [+details]


In a computer-controlled electron beam pattern generation system, the quality of the proximity effect correction may be computed at several different predetermined points in each pattern shape, and then for any pattern shape which does not have suitably accurate proximity effect correction, the pattern shape may be subdivided and recorrected for proximity effect until suitably accurate correction results.