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Mechanism Free Target Disk For Centrifugal Holding Of Wafers During Ion Implantation Disclosure Number: IPCOM000066714D
Original Publication Date: 1979-Apr-01
Included in the Prior Art Database: 2005-Feb-20

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Bayer, EH Kranik, JR Mueller, WF [+details]


A method and apparatus are described for holding wafers during ion implantation by high current ion implanters. It eliminates the need for a complex wafer return mechanism such as that described in U.S. Patent 3993018.