Mechanism Free Target Disk For Centrifugal Holding Of Wafers During Ion Implantation
Original Publication Date: 1979-Apr-01
Included in the Prior Art Database: 2005-Feb-20
A method and apparatus are described for holding wafers during ion implantation by high current ion implanters. It eliminates the need for a complex wafer return mechanism such as that described in U.S. Patent 3993018.