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Determination Of Target Contaminations By Ion Implantation Disclosure Number: IPCOM000066749D
Original Publication Date: 1979-Apr-01
Included in the Prior Art Database: 2005-Feb-20

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Hinkel, H Kaus, G Kempf, J Schmitt, A [+details]


Imperfections of the ion implantation equipment may lead to the co-implantation of unwanted impurities. Such imperfections are, for example, insufficient mass separation caused by improper focusing, or magnet current or high-voltage fluctuations. Another source for impurities is the sputtering of machine components as they are struck by the ion beam.