Determination Of Target Contaminations By Ion Implantation
Original Publication Date: 1979-Apr-01
Included in the Prior Art Database: 2005-Feb-20
Imperfections of the ion implantation equipment may lead to the co-implantation of unwanted impurities. Such imperfections are, for example, insufficient mass separation caused by improper focusing, or magnet current or high-voltage fluctuations. Another source for impurities is the sputtering of machine components as they are struck by the ion beam.