Holding Fixture For Processing Wafers
Original Publication Date: 1979-Apr-01
Included in the Prior Art Database: 2005-Feb-20
A holding fixture 1 which is used for processing wafers 2a-d by either spray developing or spray etching has a step configuration. A wafer is positioned on each respective step 3a-d. Fresh developing or etching liquid is directed from nozzles associated with each wafer to the face or exposed surface of the wafer. Each step area is provided with a separate drain. In this way, the wafers are isolated from each other and free from contaminant flow.