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Improved Resolution For Equivalent Flatness And Reduced Background Disclosure Number: IPCOM000066804D
Original Publication Date: 1979-Apr-01
Included in the Prior Art Database: 2005-Feb-20

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Freeouf, JL VanVechten, JA [+details]


The publication of George Wardly (J. Vac. Sci. Technology 12, 1313 (1975)) describes practical problems, that must be solved before Cathode Projection Micro-Fabrication Systems (CPS) become a standard production technique for submicron lithography. The basic techniques use a patterned area electron source that accelerates electrons to a flat wafer. A magnetic field parallel to the accelerating electric field provides 1 to 1 focussing of these electrons from the patterned source onto the wafer.