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Interelectrode Height Gauge

IP.com Disclosure Number: IPCOM000066871D
Original Publication Date: 1979-May-01
Included in the Prior Art Database: 2005-Feb-20

Publishing Venue

IBM

Related People

Authors:
Wong, MC [+details]

Abstract

The interelectrode distance inside a reactive ion etch or sputtering system is measured using height gauge 1. Gauge 1 has a base member 2 which is positioned on top of the lower electrode. Base member 2 carries scale 3 and a spring loaded indicator arm 4 which is pivotally attached to scale 3. When the sputtering system chamber is closed, arm 4 contacts the other electrode and is pushed down until the electrodes reach their final position. The scale is graduated so that the distance between the electrodes can be read directly.