The following operators can be used to better focus your queries.
( ) , AND, OR, NOT, W/#
? single char wildcard, not at start
* multi char wildcard, not at start
(Cat? OR feline) AND NOT dog?
Cat? W/5 behavior
(Cat? OR feline) AND traits
Cat AND charact*
This guide provides a more detailed description of the syntax that is supported along with examples.
This search box also supports the look-up of an IP.com Digital Signature (also referred to as Fingerprint); enter the 72-, 48-, or 32-character code to retrieve details of the associated file or submission.
Concept Search - What can I type?
For a concept search, you can enter phrases, sentences, or full paragraphs in English. For example, copy and paste the abstract of a patent application or paragraphs from an article.
Concept search eliminates the need for complex Boolean syntax to inform retrieval. Our Semantic Gist engine uses advanced cognitive semantic analysis to extract the meaning of data. This reduces the chances of missing valuable information, that may result from traditional keyword searching.
The use of an aluminum ring around the cathode in a diode etching chamber increases the load capability of the chamber by enhancing field uniformity.
English (United States)
This text was extracted from a PDF file.
At least one non-text object (such as an image or picture) has been suppressed.
100% of the total text.
Page 1 of 2
Diode Field Stabilizer
The use of an aluminum ring around the cathode in a diode etching chamber
increases the load capability of the chamber by enhancing field uniformity.
In reactive ion etching diode systems, such as that shown in the figure, dark
space geometry affects etch uniformity. If the dark space narrows at the
periphery of cathode 2, the wafers on the outer portion of the cathode etch faster.
Stabilizer 3 creates a more uniform E-field across the cathode.
If stabilizer 3 is placed at a distance from cathode 2, there is an unbiased
potential at the stabilizer. By adding a source of voltage 4 or by altering the
position of the stabilizer, the geometry of the dark space in the chamber may be
changed. It may be beneficial, for example, to raise the stabilizer ring 3 slightly
above the plane of cathode 2 to yield the smoothest boundary between the
plasma and the sheath. This is implemented simply by using TEFLON* screws 5.
Placing a polycrystalline silicon coating over the aluminum ring 3 prevents a
potential back sputtering of aluminum onto the wafers. *Trademark of E.I. du
Pont de Nemours & Co.
Page 2 of 2
[This page contains 2 pictures or other non-text objects]