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Process Of Forming Ion-Implanted Resistors With Implanted Contact Regions Without An Additional Mask

IP.com Disclosure Number: IPCOM000066901D
Original Publication Date: 1979-May-01
Included in the Prior Art Database: 2005-Feb-20

Publishing Venue

IBM

Related People

Authors:
Hornung, R Nuez, JP O'Hora, D Tremintin, B [+details]

Abstract

This article describes an improved process for forming ion-implanted resistors with implanted contact regions in a simiconductor wafer which does not require an additional mask for defining the implanted contact regions, therefore, assuring the self-alignment between these regions and the contact holes.