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Chemically Assisted Ion Killing

IP.com Disclosure Number: IPCOM000066952D
Original Publication Date: 1979-May-01
Included in the Prior Art Database: 2005-Feb-20

Publishing Venue

IBM

Related People

Authors:
Coburn, JW Winters, HF [+details]

Abstract

The selectivity of the ion milling process can be increased in certain favorable cases and the redeposition problem can be eliminated in these same cases if the inert gas ion milling is carried out in the presence of active gases which combine with the material being etched to form volatile compounds.