Browse Prior Art Database

Triode System For Plasma Etching Disclosure Number: IPCOM000066966D
Original Publication Date: 1979-May-01
Included in the Prior Art Database: 2005-Feb-20

Publishing Venue


Related People

Chapman, BN [+details]


A hot filament plasma etching method for etching semiconductor chips or other substrate surfaces at controlled rates and with controlled etch profiles uses the apparatus shown in the drawing.