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A technique is described for elimination of the normal errors of drift and ambient influence which restrict accuracy of absolute measurements using electron beams.
English (United States)
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Electron Beam Measurement With On-Line Calibration
A technique is described for elimination of the normal errors of drift and
ambient influence which restrict accuracy of absolute measurements using
Electron beams are well known for their ability to identify and to fabricate
features much smaller than is possible with optical equipment. Being analog in
nature, they have difficulty in obtaining accuracy and long term precision over
large distances. This is of little consequence in the usual Scanning Electron
Microscope (SEM) application since errors of a few percent are not visible to the
human eye. In microfabrication applications, distortions are eliminated by
calibration, and then registration techniques eliminate scale errors by adjusting
the field to the target. These adjustments eliminate the need for absolute
accuracy. Both these applications also address only relatively small distances.
By the use of the following techniques, errors can be minimized so that
measurements can be made with accuracies approaching the positional
accuracies of the stage holding the item to be measured (in the 0.1 um range for
a well-designed laser table). Errors of scale are eliminated by operating only with
small beam deflection. The table positions the target so a point to be measured is
under the beam and is sensed by the well-known means of sensing and
processing backscatter electrons and/or sample current. The beam is then
deflected and focused to a referenc...