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Photolith Process For Thin Film Transistors

IP.com Disclosure Number: IPCOM000067179D
Original Publication Date: 1979-Jun-01
Included in the Prior Art Database: 2005-Feb-20

Publishing Venue

IBM

Related People

Authors:
Morgan, WM [+details]

Abstract

It has become accepted practice to make thin film transistors (TFTs) by evaporative processes in a single pump down of a vacuum chamber. See, for example, A. G. Fischer. "Flat TV Panel with Polycrystalline Layers," Microelectronics 7, 5-15 (1976). Resolution is limited by the ability to prepare metal foil stencils and to align them accurately in a vacuum chamber. The supposed advantage of the single pump-down is the avoidance of device drift due to process contamination.