Low Charge Level AlCu MOS Deposition Process Using An E-Gun Source
Original Publication Date: 1979-Jul-01
Included in the Prior Art Database: 2005-Feb-20
The drawing shows a vacuum deposition chamber 1. A substrate heater assembly 2 is shown isolated from the supporting structure by pure quartz insulators 3. This heater provides the necessary substrate heating prior to the deposition of AlCu.