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Method Of Producing Very Thin Layers By Means Of An Ion Implanter

IP.com Disclosure Number: IPCOM000067297D
Original Publication Date: 1979-Jul-01
Included in the Prior Art Database: 2005-Feb-20

Publishing Venue

IBM

Related People

Authors:
Baier, H Hinkel, H Kraus, G Schmid, GE [+details]

Abstract

To produce thin layers of, say, < 10 nm, a beam of ions of the layer material is directed at a substrate where the ionized particles, which are decelerated by the electric field that they produce when impinging upon the substrate, are discharged and deposited.