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Retractable Rotating Wafer Dome Support For High Production Deposition Systems

IP.com Disclosure Number: IPCOM000067467D
Original Publication Date: 1979-Aug-01
Included in the Prior Art Database: 2005-Feb-20

Publishing Venue

IBM

Related People

Authors:
Curry, WJ Dahlke, GP Galyon, GT McCollum, JM [+details]

Abstract

Because of increased weight and handling problems of high capacity wafer domes, it was necessary to design a rotating wafer dome support, with DC sputter etch capability that could be retracted from the vacuum system, unloaded/loaded, and then rolled back into the system, making a positive electrical connection and aligned with the rotation drive.