High Efficiency Short Time Optical Hardening
Original Publication Date: 1979-Aug-01
Included in the Prior Art Database: 2005-Feb-20
Patterned resist images flow during postbaking causing dimensional and profile changes. Images can be thermally stabilized by exposure to low wavelength (2537 A) ultraviolet in the presence of either CF(4) or CFC1(2)CF(2)C1 (FREON TF*), but this has required exposure times of 12 to 20 minutes.