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Hardware Technique For Processing Electron Beam Backscatter Signal For Registration

IP.com Disclosure Number: IPCOM000067478D
Original Publication Date: 1979-Aug-01
Included in the Prior Art Database: 2005-Feb-20

Publishing Venue

IBM

Related People

Authors:
Davis, DE Jackson, RD Williams, MC Woodard, OC [+details]

Abstract

In electron (E)-beam lithography, when overlaying previously processed layers, the deflection must be finely aligned with the target chips. This is normally done by collecting backscatter signals while scanning special alignment mark areas on each chip and processing those signals to generate deflection corrections.