Technique For Making A Protective Re, movable Metal Mask For SLM Bubble Memory Devices
Original Publication Date: 1979-Aug-01
Included in the Prior Art Database: 2005-Feb-20
An article in the IBM Technical Disclosure Bulletin 20, 5025-5030 (April 1978) discusses a process for fabricating a bubble memory device structure using Single Level Masking (SLM) in connection with the alignment of a magnetoresistive (MR) sensor to an insulating pedestal. In that process, the plated NiFe pattern serves as the mask itself to define the underlying conductor pattern and provides the active magnetic elements of the finished device.