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Ion Implant Uniformity Measuring Technique

IP.com Disclosure Number: IPCOM000067665D
Original Publication Date: 1979-Sep-01
Included in the Prior Art Database: 2005-Feb-20

Publishing Venue

IBM

Related People

Authors:
Fortino, AG Ceipel, HJ [+details]

Abstract

This technique provides a fast, simple and accurate determination of ion implant dosage uniformity in semiconductor substrates.