Browse Prior Art Database

Reversal Of Resist Polarity

IP.com Disclosure Number: IPCOM000067965D
Original Publication Date: 1979-Oct-01
Included in the Prior Art Database: 2005-Feb-20

Publishing Venue

IBM

Related People

Authors:
Feder, R Scott, RW Topalian, JC [+details]

Abstract

A negative resist pattern (resist material remains in exposed regions) may be obtained using a positive resist material (exposed portions preferentially dissolve in the developer) by first pattern exposing and developing a positive resist layer, then flood exposing the developed image, coating the flood exposed image with a new layer of positive resist material to fill in the developed away regions, and finally developing the new resist layer.