Browse Prior Art Database

Resist Stabilization By Electron Beam

IP.com Disclosure Number: IPCOM000067966D
Original Publication Date: 1979-Oct-01
Included in the Prior Art Database: 2005-Feb-20

Publishing Venue

IBM

Related People

Authors:
Canavello, BJ Di Milia, V Hatzakis, M [+details]

Abstract

A positive photoresist pattern may be stabilized against flow at high temperatures by exposing the developed photoresist pattern to a flooding electron beam.