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Resist Stabilization By Electron Beam Disclosure Number: IPCOM000067966D
Original Publication Date: 1979-Oct-01
Included in the Prior Art Database: 2005-Feb-20

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Canavello, BJ Di Milia, V Hatzakis, M [+details]


A positive photoresist pattern may be stabilized against flow at high temperatures by exposing the developed photoresist pattern to a flooding electron beam.