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Delineation Of Small Geometries In Electron Beam Resist By Exposing Only Along The Periphery With A Focused Beam

IP.com Disclosure Number: IPCOM000068155D
Original Publication Date: 1979-Nov-01
Included in the Prior Art Database: 2005-Feb-20

Publishing Venue

IBM

Related People

Authors:
Broers, AN Chang, TPH Parikh, M [+details]

Abstract

Because of electron scattering in the resist and backscattering from the sample, it is possible to delineate small shapes by addressing the electron beam (E/B) to only the positions defining the outline of the shape without any need to address the beam to the interior of the shape. Since this reduces the number of points to which the beam must be addressed, it reduces the required system control speed and/or writing time.