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Plasma Focus Generated, Foilless E-Beam Diode

IP.com Disclosure Number: IPCOM000068175D
Original Publication Date: 1979-Nov-01
Included in the Prior Art Database: 2005-Feb-20

Publishing Venue

IBM

Related People

Authors:
Dreyfus, RW McCorkle, RA [+details]

Abstract

A device for a high current pulsed electron beam is described. It is useful for exciting atoms or ions for the generation of pulsed lasers.