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Plasma Focus Generated, Foilless E-Beam Diode Disclosure Number: IPCOM000068175D
Original Publication Date: 1979-Nov-01
Included in the Prior Art Database: 2005-Feb-20

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Dreyfus, RW McCorkle, RA [+details]


A device for a high current pulsed electron beam is described. It is useful for exciting atoms or ions for the generation of pulsed lasers.