Browse Prior Art Database

Removal Of Native Oxide Layer On A Semiconductor Surface

IP.com Disclosure Number: IPCOM000068299D
Original Publication Date: 1979-Dec-01
Included in the Prior Art Database: 2005-Feb-20

Publishing Venue

IBM

Related People

Authors:
Beyer, KD Reith, TM [+details]

Abstract

After a silicon surface has been cleaned, there may be a thin SiO(2) layer on it.