E-Beam Resists Based On Organic
Original Publication Date: 1979-Dec-01
Included in the Prior Art Database: 2005-Feb-20
The use of organic charge-transfer salts as photoresists and E-beam resists has been described. In the photolithography process differential solubility is achieved by radiation induced charge-transfer from a neutral to ionic state, while in the E-beam process the resist material changes from ionic to neutral. These resist processes display other interesting and useful properties in video storage applications, and differential conductivity which has a variety of applications where thermal conductivity, static charging, electrical sensing or electroplating are important considerations.