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E-Beam Resists Based On Organic

IP.com Disclosure Number: IPCOM000068342D
Original Publication Date: 1979-Dec-01
Included in the Prior Art Database: 2005-Feb-20

Publishing Venue

IBM

Related People

Authors:
Engler, EM Kuptsis, JD Schad, RG Tomkiewicz, Y [+details]

Abstract

The use of organic charge-transfer salts as photoresists and E-beam resists has been described. In the photolithography process differential solubility is achieved by radiation induced charge-transfer from a neutral to ionic state, while in the E-beam process the resist material changes from ionic to neutral. These resist processes display other interesting and useful properties in video storage applications, and differential conductivity which has a variety of applications where thermal conductivity, static charging, electrical sensing or electroplating are important considerations.