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An etched silicon substrate may be used to align an optical fiber to a photodiode in a geometry which enhances optical coupling.
English (United States)
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Etched Silicon Structure For Aligning A Photodiode And Optical Fiber
An etched silicon substrate may be used to align an optical fiber to a
photodiode in a geometry which enhances optical coupling.
It is well known that grooves etched along certain directions in silicon
substrates of suitable crystallographic orientation will have sloped sidewalls and
will become Vee shaped in cross-section if etching continues long enough. The
silicon structure shown in Fig. 1 may be formed in this manner.
A narrow groove 10 and a perpendicularly oriented wider groove 12 are
simultaneously etched through a native oxide mask (not shown) into a (100)
silicon substrate 14 (Fig. 1). The narrow groove 10 self terminates into a Vee
groove while the wider groove 12 etches deeper, as shown. The etched
substrate is then covered with a metallization layer 16 (Fig. 2). A photodiode
chip 18 and optical fiber 20 are then positioned as shown in Fig. 2. The
photodiode chip 18 is attached to the substrate in this position with solder dots 22
located on either side of the groove 10. An insulating standoff 24 facilitates
mechanical connection of an electrical wire 26 to the backside of photodiode 18.
Since the photodiode is canted with respect to the fiber axis and it is also not
normal to the metallization surface, some of the light reflected from the
photodiode will be returned to it by reflection from the metallization coating.
These reflections will contribute to the coupling efficiency. Suit...