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Controlled Sensitivity Resist Systems

IP.com Disclosure Number: IPCOM000068789D
Original Publication Date: 1978-Feb-01
Included in the Prior Art Database: 2005-Feb-20

Publishing Venue

IBM

Related People

Authors:
Carothers, JA Clecak, NJ Gritter, RJ Ouano, AC [+details]

Abstract

The dissolution rate of a resist or resist system is affected by many factors, for example, whether exposure has occurred, whether the film is highly porous or not, whether plasticizing compounds or polymers are present, and whether decomposition products are present. Most of these factors give an increase in solubility of the resist or resist system, and rarely permit the dissolution rate of the unexposed resist to be decreased.