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Baking Process Prior to Epitaxial Deposition Disclosure Number: IPCOM000068909D
Original Publication Date: 1978-Mar-01
Included in the Prior Art Database: 2005-Feb-20

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Related People

Cooper, SA Hrebin, G Nagarajan, A Wisdo, E [+details]


This article relates to the optimization of the baking time and temperature of a semiconductor wafer prior to the deposition of a 2-micron epitaxial (epi) layer in a barrel reactor.