Browse Prior Art Database

Baking Process Prior to Epitaxial Deposition

IP.com Disclosure Number: IPCOM000068909D
Original Publication Date: 1978-Mar-01
Included in the Prior Art Database: 2005-Feb-20

Publishing Venue

IBM

Related People

Authors:
Cooper, SA Hrebin, G Nagarajan, A Wisdo, E [+details]

Abstract

This article relates to the optimization of the baking time and temperature of a semiconductor wafer prior to the deposition of a 2-micron epitaxial (epi) layer in a barrel reactor.