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Monitoring the Etch Rate of a Constantly Changing Reflective Surface

IP.com Disclosure Number: IPCOM000069105D
Original Publication Date: 1978-Apr-01
Included in the Prior Art Database: 2005-Feb-20

Publishing Venue

IBM

Related People

Authors:
Willcox, HK [+details]

Abstract

The present apparatus involves a simple expedient for etch rate monitoring of a constantly changing reflective surface, i.e., a semiconductor surface being processed either by etching or by deposition. A mirror is placed in a fixed position with respect to the surface. Thus, in effect, we have a two-mirror structure, with the changing surface being the mirror which is constantly changing in distance from the fixed mirror. This change in distance will result in a directly proportional lateral change in the position of a reference point on the changing "mirror" with respect to a fixed point on the fixed mirror. This lateral change may be easily monitored and translated into the etch rate.