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Wafer Cleaner by Use of High Pressure Pulsating Liquid

IP.com Disclosure Number: IPCOM000069109D
Original Publication Date: 1978-Apr-01
Included in the Prior Art Database: 2005-Feb-20

Publishing Venue

IBM

Related People

Authors:
Cooper, SA Forneris, JL [+details]

Abstract

Presently, brush cleaning is used extensively in semiconductor processes to remove loose particulates on wafers. Although reasonably effective for removing contaminants, this technique has several serious shortcomings. These include:.