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A technique for producing X-ray diffraction gratings is described. These gratings can be made to effectively diffract X-rays if the wavelength of the X-rays is approximately 200 Angstroms.
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Technique for Producing X Ray Diffraction Gratings
A technique for producing X-ray diffraction gratings is described. These
gratings can be made to effectively diffract X-rays if the wavelength of the X-rays
is approximately 200 Angstroms.
Broers et al [*] have demonstrated that carbonaceous materials can be
deposited directly onto a silicon wafer to produce 100 Angstrom wide lines at a
separation of about 100 Angstroms. However, these lines are subject to slight
variations in width and thickness, and thus are unacceptable for use as masks
that are required for the production of diffraction gratings.
A satisfactory carbonaceous deposit for use in the production of diffraction
gratings may be formed by a two-step process. First, the technique of Broers et
al is used to deposit fine lines on the surface of a crystal, this surface being
orthogonal to the channeling axis of the crystal. The thickness of these lines will
vary in a gaussian manner, as illustrated in Fig. 1A. Second, the masked
surface is exposed to collimated light ions, such as helium or hydrogen, of
marginally sufficient energy to channel through the crystal. If these ions strike
region A of the coated portion of the crystal, where the coating is thickest, the
ions will be stopped. If the ions strike the thinner portion of the coating, region B,
then the energy loss will be sufficient to prevent channeling through the crystal.
Furthermore, any ions diffracted by the mask will be dechannelled by the c...