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High Temperature Resist Coating of Poly (Acrylonitrile) via Surface Photopolymerization

IP.com Disclosure Number: IPCOM000069397D
Original Publication Date: 1978-Apr-01
Included in the Prior Art Database: 2005-Feb-20

Publishing Venue

IBM

Related People

Authors:
Hiraoka, H [+details]

Abstract

The surface photopolymerization of 2-chloro-acrylonitrile was carried out with a bank of low-pressure mercury lamps. With the use of a photosensitizer, a polymer film 1 micron thick can be prepared within several minutes. The polymer is very flow-resistant at high temperatures, and after 30 minutes of heating at 1,000 Degrees C, no dimensional change of pattern was observed.