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Preselecting Silicon Wafers for LSI Process by Radiochemically Determining the Contamination of the Wafer Surface

IP.com Disclosure Number: IPCOM000069539D
Original Publication Date: 1978-May-01
Included in the Prior Art Database: 2005-Feb-20

Publishing Venue

IBM

Related People

Authors:
Hoffmeister, WW Malin, K Schumacher, H Thiel, K [+details]

Abstract

Radiochemical tracer techniques with Fe/59/ and Ni/63/ have shown that the adsorption of the elements Fe and Ni as impurities from Di-water and buffered etch solutions fluctuates, being independent of the impurity concentration of the solutions.