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Electron Beam Induced Polymerization of Acrylonitriles on Substrates

IP.com Disclosure Number: IPCOM000069588D
Original Publication Date: 1978-May-01
Included in the Prior Art Database: 2005-Feb-21

Publishing Venue

IBM

Related People

Authors:
Hiraoka, H [+details]

Abstract

A scanning auger electron gun was used to generate polymer lines on a silicon oxide layer of a silicon wafer, which was cooled to about -50 Degrees C. The pressure of the vacuum chamber was maintained at about 10/-5/ torr. The electron beams were scanned at a rate of 10/-5/C/cm/2/ at 2.5 KeV. Brown colored polymer patterns were obtained with 2-chloro-acrylonitrile, and with acrylonitrile.