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In Situ Monitoring and Fabrication of Ultra Small Nanodevice Structures

IP.com Disclosure Number: IPCOM000069623D
Original Publication Date: 1978-May-01
Included in the Prior Art Database: 2005-Feb-21

Publishing Venue

IBM

Related People

Authors:
Broers, AN Cuomo, JJ Laibowitz, RB Molzen, WW [+details]

Abstract

Surface migrating resist lithography which involves electron-beam conversion of a resist that builds by surface migration is also very useful for fabricating nanostripes. These stripes can be used as connecting lines, resistors and other parts of microcircuitry. When superconductors are used as the stripe material, Josephson nanobridges will result.