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Automatic Pressure Control of Mixed Gases

IP.com Disclosure Number: IPCOM000069626D
Original Publication Date: 1978-May-01
Included in the Prior Art Database: 2005-Feb-21

Publishing Venue

IBM

Related People

Authors:
Silano, P [+details]

Abstract

A feedback control system is shown for maintaining a desired constant pressure in a dynamic sputtering chamber 1, where the pressure may vary due to changes in pumping speed, outgassing, etc.