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Hotplate for Photoresist Baking Disclosure Number: IPCOM000069712D
Original Publication Date: 1978-Jun-01
Included in the Prior Art Database: 2005-Feb-21

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Related People

Kaplan, LH Zimmerman, SM [+details]


A hotplate, using a circulating heating fluid, provides uniformity and bake temperature stability within +/- 0.2 degrees so that resist layers and images on substrates, such as silicon wafers, can be uniformly baked.