Browse Prior Art Database

Geometry Design to Minimize E Beam Blooming

IP.com Disclosure Number: IPCOM000069714D
Original Publication Date: 1978-Jun-01
Included in the Prior Art Database: 2005-Feb-21

Publishing Venue

IBM

Related People

Authors:
Nijhuis, RH Saraf, LH [+details]

Abstract

When the E-beam overlaps spots to fill shapes slightly larger than the fixed E-beam spot size, it results in a nonuniform rate of photoresist development, which then leads to poor develop image control. This is called the "blooming" effect. This effect occurs in processing due to the fact that the exposed shape is not an integer multiple of the E-beam spot size.