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Geometry Design to Minimize E Beam Blooming Disclosure Number: IPCOM000069714D
Original Publication Date: 1978-Jun-01
Included in the Prior Art Database: 2005-Feb-21

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Nijhuis, RH Saraf, LH [+details]


When the E-beam overlaps spots to fill shapes slightly larger than the fixed E-beam spot size, it results in a nonuniform rate of photoresist development, which then leads to poor develop image control. This is called the "blooming" effect. This effect occurs in processing due to the fact that the exposed shape is not an integer multiple of the E-beam spot size.