Browse Prior Art Database

E Beam Line Width and Pattern Location Measurement Tool

IP.com Disclosure Number: IPCOM000069727D
Original Publication Date: 1978-Jun-01
Included in the Prior Art Database: 2005-Feb-21

Publishing Venue

IBM

Related People

Authors:
Davis, DE Stickel, W Weber, EV Williams, MC Woodard, OC [+details]

Abstract

A technique is described for using an electron beam to quickly and accurately measure absolute dimensions on a target, such as a micro-circuit pattern on a semiconductor wafer. In particular, width separations and areas of lines and other pattern features even in the submicron range can be measured. Moreover, the position of these pattern features within a writing field can be accurately determined.