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E Beam Line Width and Pattern Location Measurement Tool Disclosure Number: IPCOM000069727D
Original Publication Date: 1978-Jun-01
Included in the Prior Art Database: 2005-Feb-21

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Davis, DE Stickel, W Weber, EV Williams, MC Woodard, OC [+details]


A technique is described for using an electron beam to quickly and accurately measure absolute dimensions on a target, such as a micro-circuit pattern on a semiconductor wafer. In particular, width separations and areas of lines and other pattern features even in the submicron range can be measured. Moreover, the position of these pattern features within a writing field can be accurately determined.