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Lithography by Electron Beam Stimulated Oxidation

IP.com Disclosure Number: IPCOM000069804D
Original Publication Date: 1978-Jun-01
Included in the Prior Art Database: 2005-Feb-21

Publishing Venue

IBM

Related People

Authors:
Coburn, JW Winters, HF [+details]

Abstract

This lithography method involves the electron (E)-beam irradiation of a carbon film to form a mask having precise delineation.