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Depth Calibration of Sputter Profiles with Several Metallized Layers

IP.com Disclosure Number: IPCOM000069969D
Original Publication Date: 1978-Jul-01
Included in the Prior Art Database: 2005-Feb-21

Publishing Venue

IBM

Related People

Authors:
Kaus, G Schmid, G [+details]

Abstract

For determining the depth profile of multilayer thin film elements, the sputter depth profile, the measuring times of which are different because of the different sputter rates of the various layer substances, is corrected by correlating the measuring times and particular measuring data. The measuring data used for correction are obtained by analyzing the shape of the peripheral areas of the sputter crater.