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Photodeformable Materials

IP.com Disclosure Number: IPCOM000070052D
Original Publication Date: 1978-Jul-01
Included in the Prior Art Database: 2005-Feb-21

Publishing Venue

IBM

Related People

Authors:
Aviram, A [+details]

Abstract

It has been demonstrated successfully that films of poly-p-(N,N-dimethyl-amino)-N-gamma-D-glutamanilide, (Image Omitted) crosslinked with 2,7,-bis (bromomethyl)-naphtalene, coated onto a substrate that contains a film of organic silane (for better adhesion) can be irradiated in the presence of CBr(4) (or other halogenated organic materials) to form patterns. These patterns reproduce the image projected onto the films.